Tess ) Li, Richard Chi-Hsi: RF circuit design. - New York, NY : Wiley, 2009. - 827 S. : graph. Darst. ( Kollat: 827 S. : graph. Darst.)ISBN: 978-0-470-16758-8
Sign.: III 319.281 * Inv.Nr.: 278.391 * Standort: Magazin
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| ( Tess ) Li, Richard Chi-Hsi: RF circuit design. - New York, NY : Wiley, 2009. - 827 S. : graph. Darst. ( Kollat: 827 S. : graph. Darst.) ISBN: 978-0-470-16758-8 Sign.: III 319.281 * Inv.Nr.: 278.391 * Standort: Magazin |